多约束直线阵列天线辐射散射特性优化

多约束直线阵列天线辐射散射特性优化

内容简介：对于有口径、阵元数和最小阵元间距约束的直线阵列天线,运用改进的遗传算法通过调整单元的位置来同时优化其辐射和散射特性.并用矩量法验证了论文算例经优化后,完全计入互耦的辐射方向图峰值副瓣电平在-18.5 dB以下,且在绝大部分角域处于低散射状态,表明论文方法能指导兼顾辐射和散射特性的多约束阵列天线设计.

Abstract：Considering a linear array with the constraints of array aperture,the number of elements and minimum element spacing,an improved genetic algorithm (IGA)is presented and used for optimizing both the radiation and scattering characteristics of it by adj usting the element placement.Compared with the uniform array,the proposed method makes the nonuniform array produce lower peak side lobe leveI(PSLL)and be at the status that it scatters with low level for most incident angles.The simulated results validating the accuracy of this method are presented.

作者：张帅, 龚书喜, 凌劲, 路宝, 龚琦,

关键词：遗传算法, 矩量法, 副瓣抑制, 雷达散射截面减缩,